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Semiconductor Characterization

Trevor Thornton

This specialization provides an overview of how semiconductors are characterized. After a review of semiconductor basics, the courses cover electrical, electron beam, ion beam, x-ray, and optical measurement techniques for semiconductor materials and devices. Topics covered include diodes, MOSFETs, microscopy, and spectroscopy. Skills in semiconductor characterization are important for many careers in electrical engineering, including the ever-changing field of electronic device manufacturing.

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What's inside

Five courses

Fundamentals of Semiconductor Characterization

The goal of this course is to review the fundamentals of semiconductor materials, p-n junction diodes, and MOS capacitors. This course will focus on semiconductor materials and devices relevant to CMOS manufacturing, but the concepts can be applied much more broadly.

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Electrical Characterization: Diodes

Course 2 starts with the definitions of resistivity and sheet resistance of semiconductors and metals. We see how to calculate the sheet resistance of a thin conducting film once we know its resistivity. Current-voltage (IV) measurements of p-n junction diodes are used to extract key device parameters such as the ideality factor and series resistance.

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Electrical Characterization: MOSFETs

MOSFET transistor switches are the workhorse of semiconductor-based electronics. This course covers MOS capacitors, MOSFET electrical characteristics, and how current-voltage measurements are used to determine the threshold voltage.

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Electron and Ion Beam Characterization

Electron and ion beams are extensively used for qualitative and quantitative analysis of semiconductor materials and devices. They can be used to image structures with sub-nm resolution and to provide information about elemental composition and dopant concentration.

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Optical and X-Ray Characterization

Optical and X-ray techniques characterize semiconductor thin films, measuring thickness, purity, crystalline quality, and composition. Modern techniques are fast, non-destructive, and provide rapid assessment of material properties.

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Learning objectives

Students will identify characteristics of complementary metal-oxide semiconductor (cmos) materials and devices.
Students will distinguish among different types of semiconductor characterization.

Students will apply their understanding of different measurement techniques to real-world situations.

Students will identify characteristics of complementary metal-oxide semiconductor (cmos) materials and devices.
Students will distinguish among different types of semiconductor characterization.
Students will apply their understanding of different measurement techniques to real-world situations.

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Time

0 hours

Level

Intermediate

Via

Coursera

Institution

Arizona State University

Instructor

Trevor Thornton

Level

Intermediate

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